US PATENT SUBCLASS 118 / 723 R
.~.~ By creating electric field (e.g., gas activation, plasma, etc.)

Current as of: June, 1999
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118 /   HD   COATING APPARATUS

715  DF  GAS OR VAPOR DEPOSITION {9}
722  DF  .~ With treating means (e.g., jarring) {2}
723 R.~.~ By creating electric field (e.g., gas activation, plasma, etc.) {8}
723 VE  DF  .~.~.~> Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) {2}
723 MP  DF  .~.~.~> Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means)
723 FE  DF  .~.~.~> Focused electron beam gas energizing means
723 FI  DF  .~.~.~> Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting)
723 MW  DF  .~.~.~> Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) {3}
723 HC  DF  .~.~.~> Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.) {1}
723 E  DF  .~.~.~> Having glow discharge electrodes (e.g., DC, AC, RF, etc.) {1}
723 I  DF  .~.~.~> Radio frequency antenna or radio frequency inductive coil discharge means {1}

Unofficial Alpha Subclasses: R VE CB EB MP FE FI MW ME MR MA AN HC DC ER IR

DEFINITION

Classification: 118/723

By means creating additional electric field:

(under subclass 722) Apparatus wherein the means performing the additional conditioning creates an electric field which acts on the base or coating material.