US PATENT SUBCLASS 204 / 298.23
.~.~.~ Moving workpiece or target


Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.23.~.~.~ Moving workpiece or target {6}
298.24  DF  .~.~.~.~> Indeterminate length moving workpiece
298.25  DF  .~.~.~.~> Multi-chamber (e.g., including air lock, load/unload chamber, etc.)
298.26  DF  .~.~.~.~> Plural diverse treatment stations, zones, or coating material source within single chamber
298.27  DF  .~.~.~.~> Plural modes of movement (e.g., planetary, epicyclic, etc.)
298.28  DF  .~.~.~.~> Rotational movement
298.29  DF  .~.~.~.~> Oscillatory movement


DEFINITION

Classification: 204/298.23

Moving workpiece or target:

(under subclass 298.02) Apparatus including means for moving the target or workpiece relative to each other.