US PATENT SUBCLASS 216 / 12
FORMING OR TREATING MASK USED FOR ITS NONETCHING FUNCTION (E.G., SHADOW MASK, X-RAY MASK, ETC.)


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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

12FORMING OR TREATING MASK USED FOR ITS NONETCHING FUNCTION (E.G., SHADOW MASK, X-RAY MASK, ETC.)


DEFINITION

Classification: 216/12

FORMING OR TREATING MASK USED FOR ITS NONETCHING FUNCTION (E.G., SHADOW MASK, X-RAY MASK, ETC.):

(under the class definition) Process wherein etching is used in forming or treating a mask whose function is other than as an etch mask or etch resist, e.g., shadow mask, X-ray mask, etc.

SEE OR SEARCH THIS CLASS, SUBCLASS:

41+, for the masking of a substrate using an etch resist.

56, for making a porous or perforated article not used for masking.

SEE OR SEARCH CLASS

378, X-Ray or Gamma Ray Systems or Devices,

35, for mask used in a nonetching function. 430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof,

5, for a radiation mask produced by a photos:graphic step.