(under subclass 492.2) Subject matter having means (e.g., template, program) representing information necessary to variably expose the semiconductor object or material and means or steps responsive to the representing means to irradiate or re-irradiate the object or material accordingly.
(1) Note. Systems or methods of this subclass type may include memory means, deflection coils, feedback loops, computer processing means, and object movement means.
(2) Note. Patterns of this subclass type may, for example, reduce the "proximity effect" on the semiconductor object or material.
SEE OR SEARCH THIS CLASS, SUBCLASS:
398, for deflecting or focussing charged particles onto the object.
491.1, for alignment of the irradiating beam and target.
