US PATENT SUBCLASS 427 / 255.37
.~.~.~.~ Silicon dioxide coating


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

248.1  DF  COATING BY VAPOR, GAS, OR SMOKE {9}
255.23  DF  .~ Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized {5}
255.28  DF  .~.~ Coating formed from vaporous or gaseous phase reaction mixture (e.g., chemical vapor deposition, CVD, etc.) {4}
255.29  DF  .~.~.~ Inorganic oxygen, sulfur, selenium, or tellurium (i.e., chalcogen) containing coating (e.g., phosphosilicate, silicon oxynitride, etc.) {2}
255.37.~.~.~.~ Silicon dioxide coating


DEFINITION

Classification: 427/255.37

Silicon dioxide coating:

(under subclass 255.29) Process wherein the chalcogen containing coating is or contains silicon dioxide.