US PATENT SUBCLASS 427 / 566
.~.~ Electron irradiation (e.g., e-beam evaporation, etc.)

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
561  DF  .~ Pretreatment of coating supply or source outside of primary deposition zone or off site {4}
566.~.~ Electron irradiation (e.g., e-beam evaporation, etc.) {1}
567  DF  .~.~.~> Silicon or metal oxide coating (e.g., glass, etc.)

DEFINITION

Classification: 427/566

Electron irradiation (e.g., e-beam evaporation, etc.):

(under subclass 561) Processes wherein the direct application of electrons is employed to treat the coating material supply.