US PATENT SUBCLASS 430 / 174
.~.~.~.~.~ Includes additional adjuvant other than acidic stabilizer


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
171  DF  .~.~.~ Diazonium compound containing {9}
173  DF  .~.~.~.~ At least two couplers {1}
174.~.~.~.~.~ Includes additional adjuvant other than acidic stabilizer


DEFINITION

Classification: 430/174

Includes additional adjuvant other than acidic stabilizer:

(under subclass 173) Compositions wherein an additional ingredient is present in the composition other than an acidic stabilizer or a coupler which is used to finish or perfect the image.

(1) Note. Ingredients having an acid moiety or acid function are excluded from this subclass.