US PATENT SUBCLASS 430 / 176
.~.~.~.~ Polymeric mixture

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
171  DF  .~.~.~ Diazonium compound containing {9}
176.~.~.~.~ Polymeric mixture

DEFINITION

Classification: 430/176

Polymeric mixture:

(under subclass 171) Compositions wherein the radiation-sensitive diazonium compound and a polymer are present together in admixture, e.g., a diazonium salt and polyvinyl alcohol, etc.