US PATENT SUBCLASS 430 / 192
.~.~.~.~ Polymeric mixture


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
189  DF  .~.~.~ Quinone diazide containing {4}
192.~.~.~.~ Polymeric mixture


DEFINITION

Classification: 430/192

Polymeric mixture:

(under subclass 189) Compositions wherein the radiation-sensitive quinone diazide compound and a polymer are present together in admixture, e.g., an o-naphthoquinone diazide compound, and a phenolformaldehyde resin such as novolak resin.