US PATENT SUBCLASS 430 / 310
.~.~.~ Including etching of substrate

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
300  DF  .~ Making printing plates {6}
309  DF  .~.~ Post imaging process {1}
310.~.~.~ Including etching of substrate

DEFINITION

Classification: 430/310

Including etching of substrate:

(under subclass 309) Processes wherein the process procedure is removal of portions of the medium beneath the imaged radiation-sensitive layer.