US PATENT SUBCLASS 430 / 314
.~.~.~ Etching of substrate and material deposition

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
311  DF  .~ Making electrical device {3}
313  DF  .~.~ With formation of resist image, and etching of substrate or material deposition {5}
314.~.~.~ Etching of substrate and material deposition

DEFINITION

Classification: 430/314

Etching of substrate and material deposition:

(under subclass 313) Processes wherein portions of the medium are removed and material is deposited on the medium.