US PATENT SUBCLASS 430 / 322
.~ Forming nonplanar surface

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
322.~ Forming nonplanar surface {3}
323  DF  .~.~> Including etching substrate
324  DF  .~.~> Including material deposition
325  DF  .~.~> Post image treatment to produce elevated pattern {1}

DEFINITION

Classification: 430/322

Forming nonplanar surface:

(under subclass 269) Processes wherein imaged areas of the medium are elevated or lowered relative to the rest of the medium.