US PATENT SUBCLASS 430 / 534
.~.~.~.~ Next to polymer of unsaturated monomer

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

495.1  DF  RADIATION SENSITIVE PRODUCT {7}
523  DF  .~ Identified backing or protective layer containing {5}
531  DF  .~.~ Synthetic resin or cellulose derivative containing {3}
533  DF  .~.~.~ Polyester or polycarbonate {1}
534.~.~.~.~ Next to polymer of unsaturated monomer {1}
535  DF  .~.~.~.~.~> Polymer of unsaturated ester or halide

DEFINITION

Classification: 430/534

Next to polymer of unsaturated monomer:

(under subclass 533) Subject matter containing an additional nonradiation-sensitive layer next to the polyester layer which contains the addition polymer of an unsaturated monomer.