US PATENT SUBCLASS 514 / 204
.~.~.~.~ 3-position substituent contains sulfur


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



514 /   HD   DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS

1  DF  DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) {29}
183  DF  .~ Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI {16}
200  DF  .~.~ 1-thia-5-aza-bicyclo (4.2.0) octane ring containing (including dehydrogenated) (e.g., cephalosporins, etc.) {4}
202  DF  .~.~.~ Additional hetero ring {2}
204.~.~.~.~ 3-position substituent contains sulfur {3}
205  DF  .~.~.~.~.~> The additional hetero ring is part of a polycyclo ring system
206  DF  .~.~.~.~.~> 7-position substituent contains hetero ring
207  DF  .~.~.~.~.~> Alkyl, hydroxyalkyl, alkoxyalkyl, or alkanoyloxyalkyl bonded directly to 3-position


DEFINITION

Classification: 514/204

3-position substituent contains sulfur:

(under subclass 202) Subject matter wherein a substituent in 3-position of the bicyclo octane ring system contains sulfur, e.g., [figure] [caption]etc.