US PATENT SUBCLASS 134 / 1.2
.~.~.~ Semiconductor cleaning


Current as of: June, 1999
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134 /   HD   CLEANING AND LIQUID CONTACT WITH SOLIDS

*  DD  PROCESSES {23}
1  DF  .~ Including application of electrical radiant or wave energy to work {2}
1.1  DF  .~.~ Plasma cleaning {1}
1.2.~.~.~ Semiconductor cleaning


DEFINITION

Classification: 134/1.2

Semiconductor cleaning:

(under subclass 1.1) Process wherein the work is a semiconductive precursor, substrate, or device.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Process, for (a) combined processes and (b) unit operations not elsewhere provided for manufacturing a semiconductive substrate or device.