US PATENT SUBCLASS 438 / 678
.~.~ Electroless deposition of conductive layer


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

584  DF  COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL {2}
597  DF  .~ To form ohmic contact to semiconductive material {24}
678.~.~ Electroless deposition of conductive layer


DEFINITION

Classification: 438/678

Electroless deposition of conductive layer:

(under subclass 597) Processes wherein the formation of the conductive layer is accomplished by immersion of the semiconductor substrate in a metallic salt solution and deposition therefrom without the use of electricity.