US PATENT SUBCLASS 438 / 755
.~.~.~ Silicide

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
745  DF  .~ Liquid phase etching {9}
754  DF  .~.~ Electrically conductive material (e.g., metal, conductive oxide, etc.) {1}
755.~.~.~ Silicide

DEFINITION

Classification: 438/755

Silicide:

(under subclass 754) Processes wherein the material undergoing wet chemical etching is an electrically conductive compound of silicon and a metal atom.