US PATENT SUBCLASS 438 / 782
.~.~ With substrate handling during coating (e.g., immersion, spinning, etc.)


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

758  DF  COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE {6}
778  DF  .~ Insulative material deposited upon semiconductive substrate {8}
782.~.~ With substrate handling during coating (e.g., immersion, spinning, etc.)


DEFINITION

Classification: 438/782

With substrate handling during coating (e.g., immersion, spinning, etc.):

(under subclass 778) Processes wherein the semiconductor substrate is handled or manipulated in conjunction with the coating operation.