US PATENT SUBCLASS 438 / FOR 114
.~.~.~ With substrate rotation, repeated dipping, or advanced movement (156/639.1)


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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

983  DF  ZENER DIODES {1}
FOR 100  DF  .~ Etching of semiconductor precursor, substrates, and devices used in an electrical function (156/625.1) {17}
FOR 112  DF  .~.~ With relative movement between the substrate and a confined pool of etchant (156/637.1) {2}
FOR 114.~.~.~ With substrate rotation, repeated dipping, or advanced movement (156/639.1)


DEFINITION

Classification: 438/FOR.114

With substrate rotation, repeated dipping, or advanced movement:

Foreign art collection for processes wherein the substrate is (a) rotated with respect to the pool of etchant, (b) repeatedly dipped into and removed from a pool of etchant, or (c) moved through a pool of etchant.