US PATENT SUBCLASS 438 / FOR 338
.~ Using platinum group silicide, i.e., silicide of Pt (Platinum), Pd (Palladium), Rh (Rhodium), Ru (Ruthenium), Ir (Iridium), Os (Osmium) (437/178)


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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 335  DF  FORMING SCHOTTKY CONTACT (437/175) {3}
FOR 338.~ Using platinum group silicide, i.e., silicide of Pt (Platinum), Pd (Palladium), Rh (Rhodium), Ru (Ruthenium), Ir (Iridium), Os (Osmium) (437/178)


DEFINITION

Classification: 438/FOR.338

Using Platinum Group silicide, i.e., silicide of Pt (Platinum), Pd (Palladium), Rh (Rhodium), Ru (Ruthenium), Ir (Iridium), Os (Osmium):

Foreign art collection for processes for forming a contact using the chemical combination of Si (Silicon) with one of the platinum group elements, e.g., Pt (Platinum), Pd

(Palladium), Rh (Rhodium), Ru (Ruthenium), Ir (Iridium), Os (Osmium).